Pure water’s neutral molecules are very poor conductors, but once ions dissolve in it, resistivity drops. This is because the ions act as mobile charge carriers that can carry electrons through the water. Thus, resistivity measurement is one of the key analytics for ensuring UPW quality in wafer manufacturing, and plays a vital role in the following process steps:

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Epitaxy

High-purity water with high resistivity is essential here to ensure that impurities do not incorporate into the epitaxial layers. Contaminated water can alter the electrical properties and structural integrity of the epitaxial film.

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Photolithography

Resistivity is crucial in this step, as ultra-pure water is used to rinse wafers after photoresist application and development. Low-resistivity water prevents ionic contamination that can cause defects or pattern distortions.

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Etching and Stripping

Both steps require ultra-pure water for rinsing wafers to remove chemical residues. Monitoring resistivity ensures that water used is free of contaminants that can affect etch profiles or leave residues.

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Chemical Mechanical Planarization (CMP)

The slurry and rinse water in CMP must be ultrapure with high resistivity to avoid particle contamination and ionic impurities that can cause scratches or defects on the wafer surface.

No single measurement captures the full picture of ultrapure water quality. Resistivity works alongside several other on-line parameters to ensure process integrity.

Select a parameter to explore:

Measure resistivity

Resistivity Measurement with Digital Sensors

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