Resistivity Measurement Innovation

Despite its very high purity, the ultrapure water (UPW) used in semiconductor manufacturing still contains trace levels of common metals and other electro-analytically detectable species that can negatively affect wafer yield. 

Resistivity measurement provides a cumulative measurement of these ions and is often used as the primary means of detecting ion impurity trends.

With linewidths now in the single nanometer range, the effect of impurities on wafer yield is magnified. As a result, accurate, real-time monitoring of water resistivity at points-of-use is more critical than ever.

Through close collaboration with industry partners, METTLER TOLEDO has improved temperature compensation, signal stability, and environmental isolation to provide the most accurate temperature-compensated resistivity measurement possible.

Join this live webinar and find out how you can increase wafer yield in your fab.

The talk will be followed by a Q&A session with the presenter.

Who should attend: 
Utilities Managers, Process Engineers, UPW Managers, Facilities Managers