Tunable Diode Laser (TDL) Gas Analyzers
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    Tunable Diode Laser (TDL) Gas Analyzers

    Reliable, low-maintenance gas measurement in situ and in extractive applications

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    Tunable Diode Laser Gas Analyzers from METTLER TOLEDO

    Interference-free, drift-free tunable diode laser technology offers better process control and lower maintenance costs.

    However, for rel...

    Interference-free, drift-free tunable diode laser technology offers better process control and lower maintenance costs.

    However, for reliable measurement with a tunable diode laser gas analyzer, or TDL gas analyzer for short, sometimes the required framework conditions such as minimum optical path length, the availability of a purge gas supply and/or maximum dust load get in the way. 

    Acknowledging these constraints, METTLER TOLEDO has developed specific process interface solutions that substantially increase the coverage of possible tunable diode laser gas analysis applications. 

    Based on the folded optical path principle, METTLER TOLEDO’s range of compact tunable diode laser spectrometers and unique process adaptions, for process, safety, combustion, and vapor recovery applications are essential instruments for improving your processes:

    • Versatility in monitoring your process
    • Simplicity to ease field operations
    • Performance that gives you a leading edge

    METTLER TOLEDO's unique process adaptions, make it possible to use a TDL gas analyzer in applications previously considered impossible for an in situ TDL analyzer.


    		 
    Measure Where it Matters
    Eliminate the Need for Alignment
    Tangible Performance, Minimal Maintenance

    Products and Specs

    Measure gas where it matters

     
    Products and Specs
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    Short description
    Effective path length
    Lower Detection Limit
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    Short descriptionExceptional ease of use and almost zero maintenance
    Effective path lengthProbes: 100, 200, 400 mm (3.94", 7.87", 15.75")
    Wafer cell: 50, 80, 100 mm (1.96", 3.15", 3.94")
    Extractive cell: 200, 400, 800, 1000mm, 10m.
    Lower Detection Limit100 ppm-v
    Measurement range0-100%
    Accuracy2% of reading or 100 ppm O2, whichever is greater
    LinearityBetter than 1%
    Resolution<0…01% vol O2 (100 ppm-v)
    DriftNegligible (<2% of measurement range between maintenance intervals)
    Sampling rate1 second
    Response time (T90)O2 in N2 21% >0% in <2sec
    Repeatability±0,25% of reading or 0,05% O2 (whichever is greater)
    Process pressure range0.8 bar - 5 bar (abs)/11.6 psi - 72.52 psi (abs)
    Process temperature range0-250 ºC(32-482 ºF)
    Optional(for probe instalation) 0-600 ºC (0-1112 ºF) with additional thermal barrier
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    Short descriptionExceptional ease of use and almost zero maintenance
    Effective path lengthProbes: 100, 200 400 mm (3.94”, 7.87”, 15.75”)
    Wafer Cell: 50, 80, 100 mm (1.96”, 3.15”, 3.94”)
    Extractive cell: 200, 400, 800, 1000mm.
    Lower Detection Limit0.6ppm-v
    Measurement range0-1%
    Accuracy2% of reading or 1000 ppm, whichever is greater
    LinearityBetter than 1%
    Resolution0.6 ppm-v
    DriftNegligible (< 2% of measurement range between maintenance intervals)
    Sampling rate1 second
    Response time (T90)HCl in N2 1% to O% in < 4 sec
    Repeatability± 0.25% of reading or 3 ppm-v HCl(whichever is greater)
    Process pressure range0.8 bar - 3 bar (abs)/ 11.6 psi - 43.5 psi (abs)
    Process temperature range0 – + 250 °C (+ 32 –+ 482 °F) Optional (for probe installation) 0 – + 600 °C (0 – +1112 °F) with additional thermal barrier,
    0 – + 150 °C (+ 32 –+ 302 °F) (White cell)
    See details
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    Short descriptionExceptional ease of use and almost zero maintenance
    Effective path lengthProbes: 100, 200 400 mm (3.94”, 7.87”, 15.75”)
    Wafer Cell: 50, 80, 100 mm (1.96”, 3.15”, 3.94”)
    Extractive cell: 200, 400, 800, 1000mm.
    Lower Detection Limit20 ppm-v
    Measurement range0-50%
    Accuracy2% of reading or 1000 ppm, whichever is greater
    LinearityBetter than 1%
    Resolution20 ppm-v
    DriftNegligible (< 2% of measurement range between maintenance intervals)
    Sampling rate1 second
    Response time (T90)H2S in N2 1% to O% in < 4 sec
    Repeatability± 0.25% of reading or 100 ppm-v H2S (whichever is greater)
    Process pressure range0.8 bar - 2 bar (abs)/ 11.6 psi - 29 psi (abs)
    Process temperature range0 – + 250 °C (+ 32 –+ 482 °F) Optional (for probe installation) 0 – + 600 °C (0 – +1112 °F) with additional thermal barrier,
    0 – + 150 °C (+ 32 –+ 302 °F) (White cell)
    See details
    Read more See less
    Short descriptionExceptional ease of use and almost zero maintenance
    Effective path lengthProbes: 100, 200, 400 mm (3.94", 7.87", 15.75")
    Wafer cell: 50, 80, 100 mm (1.96", 3.15", 3.94")
    Extractive cell: 200, 400, 800, 1000mm, 10m.
    Lower Detection Limit1 ppm-v
    Measurement range0-20,000 ppm (0-2%)
    Accuracy2% of reading or 1 ppm, whichever is greater
    LinearityBetter than 1%
    Resolution1 ppm-v
    DriftNegligible (<2% of measurement range between maintenance intervals)
    Sampling rate1 second
    Response time (T90)CO in N2 300 ppm-v to 0% in <4 sec
    Repeatability±0,25% of reading or 5 ppm-v CO (whichever is greater)
    Process pressure range0.8 bar - 2 bar (abs)/11.6 psi - 29. psi (abs)
    Process temperature range0-250 ºC(32-482 ºF)
    Optional(for probe instalation) 0-600 ºC (0-1112 ºF) with additional thermal barrier
    See details
    Read more See less
    Short descriptionExceptional ease of use and almost zero maintenance
    Effective path lengthProbes: 100, 200, 400 mm (3.94", 7.87", 15.75")
    Wafer cell: 50, 80, 100 mm (1.96", 3.15", 3.94")
    Extractive cell: 200, 400, 800, 1000mm, 10m.
    Lower Detection Limit5 ppm-v
    Measurement range0-200,000 ppm (0-2%)
    Accuracy2% of reading or 10 ppm, whichever is greater
    LinearityBetter than 1%
    Resolution5 ppm-v
    DriftNegligible (<2% of measurement range between maintenance intervals)
    Sampling rate1 second
    Response time (T90)H2O in N2 1% to 0% in <4 sec
    Repeatability±0,25% of reading or 50 ppm-v O2 (whichever is greater)
    Process pressure range0.8 bar - 2 bar (abs)/11.6 psi - 29. psi (abs)
    Process temperature range0-250 ºC(32-482 ºF)
    Optional(for probe instalation) 0-600 ºC (0-1112 ºF) with additional thermal barrier
    See details
    Read more See less
    Short descriptionExceptional ease of use and almost zero maintenance
    Effective path lengthProbes: 100, 200, 400 mm (3.94", 7.87", 15.75")
    Wafer Cell: 50, 80, 100 mm (1.96", 3.15", 3.94")
    Extractive cell: 200, 400, 800, 1000mm, 10m.
    Lower Detection Limit1500 ppm-v
    Measurement range0–100%
    Accuracy2% of reading or 1500 ppm, whichever is greater
    LinearityBetter than 1%
    Resolution1500 ppm-v
    DriftNegligible (< 2% of measurement range between maintenance intervals)
    Sampling rate1 second
    Response time (T90)CO in N2 300 ppm-v to 0% in < 4 sec
    Repeatability± 0.25% of reading or 0.75%-v CO (whichever is greater)
    Process pressure range0.8 bar – 1.5 bar (abs)/ 11.6 psi – 21.7.psi (abs)
    Process temperature range0 – + 250°C (+ 32 –+ 482 °F) Optional (for probe installation) 0 – + 600 °C (0 – +1112 °F) with additional thermal barrier,
    0 – + 150 °C (+ 32 –+ 302 °F) (White cell)
    See details
    Read more See less
    Short descriptionExceptional ease of use and almost zero maintenance
    Effective path lengthProbes: 100, 200, 400 mm (3.94", 7.87", 15.75")
    Wafer Cell: 50, 80, 100 mm (1.96", 3.15", 3.94")
    Extractive cell: 200, 400, 800, 1000mm, 10m.
    Lower Detection Limit1000 ppm-v
    Measurement range0–100%
    Accuracy2% of reading or 1000 ppm, whichever is greater
    LinearityBetter than 1%
    Resolution1000 ppm-v
    DriftNegligible (< 2% of measurement range between maintenance intervals)
    Sampling rate1 second
    Response time (T90)CO2 in N2 1% to O% in < 4 sec
    Repeatability± 0.25% of reading or 5000 ppm-v CO2 (whichever is greater)
    Process pressure range0.8 bar – 2 bar (abs)/ 11.6 psi – 29.psi (abs)
    Process temperature range0 – + 250 °C (+ 32 –+ 482 °F) Optional (for probe installation) 0 – + 600 °C (0 – +1112 °F) with additional thermal barrier,
    0 – + 150 °C (+ 32 –+ 302 °F) (White cell)
    See details
    Read more See less
    Short descriptionExceptional ease of use and almost zero maintenance
    Effective path lengthProbes: 100, 200, 400 mm (3.94", 7.87", 15.75")
    Wafer Cell: 50, 80, 100 mm (1.96", 3.15", 3.94")
    Extractive cell: 200, 400, 800, 1000mm, 10m.
    Lower Detection Limit1000 ppm-v (CO2)
    1500 ppm-v (CO)
    Measurement range0–100%(CO2 and CO)
    Accuracy2% of reading or 1000 ppm, whichever is greater
    LinearityBetter than 1%
    Resolution1000 ppm-v
    DriftNegligible (< 2% of measurement range between maintenance intervals)
    Sampling rate1 second
    Response time (T90)CO2 in N2 1% to O% in < 4 sec
    Repeatability± 0.25% of reading or 5000 ppm-v CO2 or CO (whichever is greater)
    Process pressure range0.8 bar – 2 bar (abs)/ 11.6 psi – 29.psi (abs)
    Process temperature range0 – + 250 °C (+ 32 –+ 482 °F) Optional (for probe installation) 0 – + 600 °C (0 – +1112 °F) with additional thermal barrier,
    0 – + 150 °C (+ 32 –+ 302 °F) (White cell)
    Comparison

    Documentation

    Learn more about our TDL Gas Analyzers

    Brochures

    Gas Analytics Brochure
    Gas Analysis: Rethinking Gas Analytics
    Safety, quality, productivity: that’s what’s most important to you. And that’s why our approach to designing analyzers and sensors is based around a s...

    White papers

    White Paper: TDLs for All Your Processes – Folded-Path Gas Analyzers
    TDLs for All Your Processes – Folded-Path Gas Analyzers
    Our portfolio of folded-path tunable diode laser (TDL) gas analyzers now has a unique range of process adaptions. Combined, they have opened the door...
    No More Purge Gas-New TDLs for Combustion Processes
    No More Purge Gas-New TDLs for Combustion Processes
    This white paper explains how the new generation of TDLs not only offers exceptional fuel costs savings, but eliminates the need for process side purg...
    Measurement of Oxygen Concentration
    Measurement of Oxygen Concentration in Blanketing and Inerting Operations
    Gaseous oxygen measurement with amperometric sensors is the most direct and easiest solution for protection against oxidation and explosion.
    Inerting Made Efficient, Replacing Extractive Oxygen Analyzers
    Inerting Made Efficient, Replacing Extractive Oxygen Analyzers
    Manufacturing operations must keep output and quality their top priority. Switching from maintenance-intensive on-line extractive systems to a more re...
    Measurement of Oxygen Concentration
    Measurement of Oxygen Concentration
    Gaseous oxygen measurement with amperometric sensors is the most direct and easiest solution for protection against oxidation and explosion.
    Polarographic Oxygen Measurement
    Polarographic Oxygen Measurement
    For the measurement of oxygen in continuous process analysis, several technologies are available.
    Minimizing Inerting System Maintenance
    Minimizing Inerting System Maintenance
    This white paper explains how TDL O₂ sensor can minimize inerting system maintenance & how to integrate them into a DCS system for fully automated oxy...
    Gas Analysis Made Easy
    Gas Analysis Made Easy
    Tunable Diode Laser (TDL) oxygen sensors from METTLER TOLEDO unite the best elements of two technologies to form a highly dependable monitoring system...

    Manuals

    Safety Manual for TDLS GPro 500 - Tunable Diode Laser Spectrometer
    Safety Manual for TDLS GPro 500 - Tunable Diode Laser Spectrometer
    This document contains information and safety instructions required to use the GPro 500 with direct analog output option in SIL environments.

    Services

    Maximum Benefits from the Start

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    Performance
    Maintenance & Optimization
    Expertise
    Training & Consulting
     
     
     
     
     
     
     
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